Hafnium silicide, a type of transitional metal silicide, and a type refractory intrametallic compounds is one example. A unique combination of chemical and physical properties makes hafnium silicide a highly effective choice in fields such as bulk structural components and semiconductor components, thin films coatings, photovoltaic materials, and thermoelectric materials.
Hafnium-disilicide nanomaterials exhibit special electrical and optical properties. They could also be useful in catalysis.
What is Hafnium Diilicide HfSi2 Used for?
1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating
Carbon fiber reinforced carbon (Chand C), composite is a novel type of high temperature composite that uses carbon fiber reinforcement and pyrolyticcarbon as a matrix. The composite’s excellent properties at high temperatures, ablation resistance, good friction and wear characteristics led to research by the United States on Chammer C composites for thermal structures. This work resulted in the creation of Cmax C Composites from thermal-structure materials to cauterized heat-proof materials. C/C can be used as a thermal structure material in components for gas turbine engines, spacecraft nose cone caps, and wing leading edges. Many of these parts are designed to work in high temperatures and oxidation environments.
CPAC composites, however, are very easy to oxidize. They will usually not function normally in an oxygen atmosphere higher than 400. Chammer C composites need to be properly protected from oxidation. The preparation of an anti-oxidation coat is one of the most important protective measures. The results indicate that C / C composites have a higher ablation rate when additional refractory materials Zr, Hf and Ta are added to their carbon matrix. To understand the influence of Hf,Ta on Chand-C composites’ ablation performance, SiC–HfSi2-TaSi2 antiablation coated was prepared by embedding. Oxyacetylene ablation devices were used to measure the coating’s ablation performance. Knot.
2. To create organic light-emitting gadgets
The package cover covers the light emitting layers and the cathode on anode. A silicon carbonitride-based layer is used as a barrier to protect the silicon carbonitride. The barrier layer contains silicide as well as metal oxides. At least one is chromium, tantalum, hafnium, titanium, molybdenum, and tungsten silicide. The metal dioxide can be chosen from aluminum trioxide or magnesium oxide. The organic light-emitting device mentioned above has a longer life span.
3. To prepare silicon-germanium-alloy-based thermoelectric components
The silicon-germanium alloy-based, silicon-germanium thermoelectric element comprises an electrode layer as well as a silicon-germanium alloy-based thermal layer. A barrier layer is placed between the electrode and the silicon–germanium mixture-based temperatureelectric layer. The barrier layer is made up of silicide as well as silicon nitride. The silicide contains at least one silicide from each of the following: molybdenum silicides; tungsten silicide; cobalt silicide; nickel silicide; zirconium silicide; tantalum silicide or hafnium silicide. The interface of silicon-germanium alloy based thermoelectric element has a well-bonded structure. It is resistant to cracks and diffusion phenomena, can withstand high temperature accelerated testing for a long time, and is thermally stable.
4. To prepare the cermet coating with high temperature resistance, oxidation resistance, and other properties.
The composite film has a thickness of 10mm x 50mm. The refractory metallic is one or many of molybdenum or tantalum as well as zirconium, zirconium or hafnium. The refractory compound is composed of silicon carbide and one to more of tantalum carbide, zirconium carbide and hafnium carbide. Intermetallic compounds are one or more molybdenum silicides or zirconium silicides. The crystal structure of the coating is made of amorphous, / or polycrystalline microparticles.
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