Category: Silicide Powder

Silicide Powder

Titanium Silicide TiSi2 Powder CAS 12039-83-7

About Titanium Silicide TiSi2 Powder:
With the rapid development of large integrated circuits (ULSI), the size of the equipment and equipment is getting smaller, the requirements for equipment size, film quality, and thickness uniformity are getting higher.

At present, the wire width of the semiconductor device has been reduced to less than 0.1 μm, so it is impossible to obtain a continuous conductor having a low resistance during the original process.

New materials, new processes, and new deposition systems must be found to improve or replace aluminum and heavy-doped polysilicon for circuit metallization.

In these new materials, metal silicon having high conductivity and high-temperature stability has increasing interest, compatible with the current microelectronic manufacturing process. Titanium Disilicide has low resistivity, high temperature and good stability.
In a commonly studied metal silicide (such as TSI2, Nisi, Cosi2, WSI2, Tasi2, MOSI2), silicide (Tisi2) has ideal characteristics: high conductivity, high selectivity, good thermal stability, good SI Adsorption, good process adaptation of silicon adaptive connection parameters. Therefore, in the integrated circuit device, titanium silicide is widely used to produce a metal oxide semiconductor (MOS), a metal oxide semiconductor field-effect transistor (MOSFET) and a dynamic random access memory (DRAM) gate, source/leakage, mutual contact ohm. Feel free to send an inquiry to get the latest price if you would like to buy Titanium Silicide TiSi2 Powder in bulk.

Characteristics of Titanium Silicide TiSi2 Powder:
Titanium silicide TiSi2 powder (CAS 12039-83-7) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high temperature ductility, a binary alloy systemthe intermediate phase.

Technical Parameter of Titanium Silicide TiSi2 Powder:

Chemical Composition of Titanium Silicide TiSi2 Powder:

How is Molybdenum Silicide MoSi2 Powder produced?
Ti silicide can be obtained from the reaction between titanium or hydride and silicon.
Ti + 2 Si → Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
Another method is to react with titanium tetrachloride to silane, dichloronilane or silicon.
TiCl4 + 2 SiH4 → Tisi2 + 4 HCl + 2 H2
TiCl4 + 2 SiH2Cl2 + 2 H2 → Tisi2 + 8 HCL
TiCl4 + 3 Si → Tisi2 + SiCL4
 
Applications of Molybdenum Silicide MoSi2 Powder:
Titanium disilicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistor connections. In the microelectronic industry, it is typically used in the C54 phase.
1. Silicide Titanide is low, the melting point is high, and the chemical properties are stable, and there is a broad use prospect in the microelectronics field.
2. Aerospace industry, ship submarine manufacturing, medical, jewelery manufacturing.

Packing & Shipping of Titanium Silicide TiSi2 Powder :
We have many different kinds of packing which depends on the titanium silicide TiSi2 powder quantity.
Titanium silicide TiSi2 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Titanium silicide TiSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.


biomedicalmaterialsprogram Technology Co. Ltd. (Biomedicalmaterialsprogram) is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and Nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.
If you are looking for high-quality TiSi2 powder, please feel free to contact us and send an inquiry.
 

2023-01-10

Silicide Powder

Molybdenum Silicide MoSi2 Powder CAS 12136-78-6

 About Molybdenum Silicide MoSi2 Powder: 
MoSi2 is an intermetallic compound, molybdenum silicide is a refractory ceramic, mainly used for heating elements. It has a medium-density, a melting point of 2030 ° C, which is electrically conductive. At high temperatures, it forms a passivation layer of silica to protect it from further oxidation. The thermal stability of MoSi2 and the thermal stability of its high radiation make such materials and high radiation coatings in thermal shields from the atmosphere as they are used next to WSI2. MoSi2 is a material with a four-square crystal structure (α-modified) gray metal; its β-modification is hexagonal and unstable. It is insoluble in most acids but is dissolved in nitric acid and hydrofluoric acid.
 
Although molybdenum silicide has excellent oxidation and high Young's modulus at temperatures above 1000 ° C, it is brittle at lower temperatures. Moreover, at 1200 ° C or more, it will lose creep resistance. These properties are limited to their structural materials but can be shifted by using it as a composite with another material. 

Molybdenum disilicide (MoSi2) is a promising candidate material for high-temperature structural applications. It is a high melting point (2030 C) material with excellent oxidation resistance and a moderate density (6.24 g/cm3). However, low toughness at low temperatures and high creep rates at elevated temperatures have hindered its commercialization in structural applications. Much effort has been invested in MoSi2 composites as alternatives to pure molybdenum disilicide for oxidizing and aggressive environments. 

Molybdenum disilicide-based heating elements have been used extensively in high-temperature furnaces. The low electrical resistance of silicides in combination with high thermal stability, electron-migration resistance, and excellent diffusion-barrier characteristics is important for microelectronic applications. Feel free to send an inquiry to get the latest price if you would like to buy Molybdenum Silicide MoSi2 Powder in bulk.

Characteristics of Molybdenum Silicide MoSi2 Powder:
Molybdenum silicide MoSi2 powder (CAS 12136-78-6) has high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high temperature ductility, a binary alloy system the intermediate phase, dual characteristics of metals and ceramics.

Technical Parameter of Molybdenum Silicide MoSi2 Powder:

Chemical Composition of Molybdenum Silicide MoSi2 Powder:

How is Molybdenum Silicide MoSi2 Powder produced?
Molybdenum disilicide and MoSi2-based materials are usually made by sintering. Plasma spraying can be used to produce dense monoliths and composite forms. The material produced by this method may contain a certain proportion of β-MoSi2 due to its rapid cooling.

Applications of Molybdenum Silicide MoSi2 Powder:
Molybdenum disilicide heating elements can be used for temperatures up to 1800 ° C, in electric furnaces used in laboratory and production environment in the production of glass, steel, electronics, ceramics, and in heat treatment of materials. Molybdenum disilicide is used in microelectronics as A Contact Material.

Heating element
MoSi2 is a conductive silicide that has an oxidation property due to a stable silica layer on its surface at a high temperature.
Although the top MoSi2 element can operate at temperatures up to 1800 ° C, the material is very brittle, which may suffer serious creep during use. However, they have process advantages because they can work under high electrical loads without aging, and will not exhibit increased resistivity during use. They have antioxidant properties in air, oxygen and oxygen-rich atmosphere.
Moreover, they can be used with ammonia, nitrogen, hydrogen, a rare gas, and limited vacuum, but due to the failure of the protective oxide layer, the operating temperature and life can be reduced.

MoSi2 elements are ready-made elements and can be made into a bending or straight form of a variety of sizes. These elements are mainly used in production furnaces and laboratory furnaces in ceramics, glass, steel, electronics and heat treatment industries.

High-temperature structure
Amazingness and high-temperature elasticity make MoSi2 a very promising material for high-temperature applications such as gas turbine engines. Many researchers strive to improve high temperature creep resistance and low-temperature ductility. However, there are no commercially available composites with all preferred features.

Packing & Shipping of Molybdenum Silicide MoSi2 Powder :
We have many different kinds of packing which depends on the molybdenum silicide MoSi2 powder quantity.
Molybdenum silicide MoSi2 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Molybdenum silicide MoSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.


biomedicalmaterialsprogram Technology Co. Ltd. (Biomedicalmaterialsprogram) is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and Nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.
If you are looking for high-quality MoSi2 powder, please feel free to contact us and send an inquiry.
 

2023-01-07

Silicide Powder

Titanium Silicide Ti5Si3 Powder CAS 12067-57-1

About Titanium Silicide Ti5Si3 Powder:
Ti5Si3 has good high-temperature stability, high-temperature strength and good oxidation resistance, and is expected to be used in high temperature structural materials above 1300℃.In addition, because of its low electrical resistance and thermal resistance, Ti5Si3 is also promising for electrical connection structures and diffusion barrier layers.Ti5Si3 powder can be prepared by weighing Si powder and Ti powder at the molar ratio of 3∶5 as raw materials for sintering, and Ti5Si3 compound can be synthesized by a vacuum sintering process. The sintering process is as follows: The mixture of Si powder and Ti powder in a vacuum furnace, heating up to 1350 1450℃, heat preservation, with the furnace cooling to room temperature, the sintered material is added to the anhydrous ethanol, and then into the ball mill tank, with AR gas as a protective gas, the sealed ball mill tank into the high-energy planetary ball mill, the use of wet ball mill method for refinement,) The obtained ball milling slurry was dried and ground in a vacuum, and Ti5Si3 powder was obtained by passing through a 130-mesh sieve. Biomedicalmaterialsprogram is a trusted global Titanium Silicide Ti5Si3 Powder supplier. Feel free to send an inquiry about the latest price of Titanium Silicide Ti5Si3 Powder at any time.

Product Performance of Titanium Silicide Ti5Si3 Powder:
Titanium Silicide (Ti5Si3) has very ideal characteristics. It not only has a high melting point (2403 K), low density (4.39 g/cm3), low resistivity (50 -120μΩ·cm), high hardness (968 HV), and high temperature strength, Good resistance to high temperature oxidation.

Technical Parameter of Titanium Silicide Ti5Si3 Powder:

Chemical Composition of Titanium Silicide Ti5Si3 Powder:

How is Titanium Silicide Ti5Si3 Powder Produced? 
Usually, Ti5Si3 can be prepared by casting method, powder sintering method, rapid solidification method, self-propagating combustion method and so on. But these methods are easy to cause pollution, complex processing technology, low yield and limited.
1. The invention relates to a batch preparation method for trisilicate Penta-titanium intermetallic compound powder, which is characterized by the following steps:
(1) Ti5Si3 compound was synthesized by vacuum sintering process by weighing Si powder and Ti powder at the molar ratio of 3∶5;
(2) The sintering process adopted in Step (1) is as follows: place evenly mixed Si powder and Ti powder in a vacuum furnace, raise the temperature to 1350-1450℃, hold the heat, and cool to room temperature with the furnace;
(3) The sintered materials obtained in step (2) were added into anhydrous ethanol and then loaded into a ball mill tank. The sealed ball mill tank was put into a high-energy planetary ball mill with AR gas as the protective gas and then refined by the wet ball mill method.
(4) The ball milling slurry obtained in Step (3) was vacuum dried and ground, and Ti5Si3 powder was obtained by passing through a 130-mesh sieve.
2. According to the batch preparation method of trisilicate intermetallic compound powder mentioned in Claim 1, its characteristic is that the vacuum degree of the vacuum furnace in the said step (2) is less than 1.0×10-2Pa.
3. According to the batch preparation method of a trisilicate intermetallic compound powder mentioned in claim 1, the characteristics of the method are as follows: in the said step (2), the temperature is heated to 1350-1450℃ at a speed of 20℃/min, and the temperature is held for 3-5 hours.
4. According to the batch preparation method of trisilicate intermetallic compound powder mentioned in claim 1, the characteristics of the method are that the rotational speed of the planetary ball mill in the said step (3) is 300-500 RPM and the ball grinding time is 24-48 hours.
This method of batch preparation of trisilicate Penta-titanium intermetallic compound powder, according to the molar ratio of 3∶5 weighing Si powder and Ti powder as raw materials for sintering, using vacuum sintering process to synthesize Ti5Si3 compound, the sintering process is: The mixture of Si powder and Ti powder in a vacuum furnace, heating up to 1350 1450℃, heat preservation, with the furnace cooling to room temperature, the sintered material is added to the anhydrous ethanol, and then into the ball mill tank, with AR gas as a protective gas, the sealed ball mill tank into the high-energy planetary ball mill, the use of wet ball mill method for refinement,) The obtained ball milling slurry was dried and ground in a vacuum, and Ti5Si3 powder was obtained by passing through a 130-mesh sieve. This method overcomes the defects such as melting casting method, powder pressing sintering method, rapid solidification method and self-spreading combustion method, which are easy to cause pollution, complex processing technology and low yield. The reaction process has no by-products, high purity of a powder, and can accurately control the stoichiometric ratio of products, low energy consumption, fine particle size and uniform distribution of products, high activity, can be batch preparation, no pollution, cost reduction.
 
Applications of Titanium Silicide Ti5Si3 Powder:
Titanium silicide (Ti5Si3) is widely used in the manufacture of metal oxide semiconductor (MOS), metal oxide semiconductor field-effect transistors (MOSFET) and dynamic random access memory (DRAM) gates, source/drain, interconnects and ohmic contacts.

Packing & Shipping of Titanium Silicide Ti5Si3 Powder:
We have many different kinds of packing which depend on the titanium silicide Ti5Si3 powder quantity.
Titanium Silicide Ti5Si3 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Titanium Silicide Ti5Si3 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-12-23

Silicide Powder

Tantalum Silicide TaSi2 Powder CAS 12039-79-1

About Tantalum Silicide TaSi2 Powder:
Tantalum silicide TaSi2 powder is with uniform particle size, structural stability. Tantalum silicide has excellent properties such as high melting point, low resistivity, corrosion resistance, high-temperature oxidation resistance, and good compatibility with silicon, carbon and other matrix materials. Tantalum silicide TaSi2 powder is used as the gate material, integrated circuit connection line, high-temperature oxidation resistance coating, etc., Has been widely researched and applied in electric heating elements, high-temperature structural parts, electronic devices, etc.
 
Tantalum is particularly resistant to chemicals at temperatures below 150 °C and can only be dissolved with hydrofluoric acid. Metal silicides have similar metal conductivity, high-temperature performance, oxidation resistance and compatibility with the production process of silicon integrated circuits. Transition metal silicides can be used for low-resistance gates and interconnections, and resistance contacts. Feel free to send an inquiry to get the latest price if you would like to buy Tantalum Silicide TaSi2 Powder in bulk.

How is Tantalum Silicide TaSi2 Powder produced?
The preparation methods of tantalum silicide include combustion synthesis (combustion synthesis, CS) or self-propagating high-temperature synthesis, arc melting, etc.
1. Using metal tantalum and silicon powder as raw materials, pulverize metal tantalum and silicon powder and mix them evenly, then put them in a graphite furnace and heat to 1100-1500°C for pre-reaction, then pass in hydrogen gas, and then heat to 800 The reaction is carried out at ℃ to obtain tantalum silicide. Or reduce tantalum pentoxide with calcium hydride to obtain tantalum hydride, and then heat to 1800°C to obtain metallic tantalum, and then add silicon powder to synthesize tantalum silicide.
2. Preheat the Si and Ta mixture to 350°C, then heat to 1480°C, and heat the reaction. Or make TaS2 react with SiHnX4-n at 900℃.
3. Direct method "Total silicide is prepared from tantalum metal and silicon powder as raw materials. The reaction formula is as follows.
First, pulverize and mix tantalum metal and silicon powder uniformly, and then put them in a graphite furnace and heat them to
Perform a pre-reaction at 1100-1500°C, then pass in hydrogen, and then heat up to 1800°C for a homogenization reaction for 1 hour to obtain tantalum silicide.
4. Tantalum pentoxide reduction method: firstly reduce tantalum pentoxide with calcium hydride to obtain tantalum hydride, then heat to 1800°C to obtain tantalum metal, and then add silicon powder to synthesize tantalum silicide.

Technical Parameter of Tantalum Silicide TaSi2 Powder:

Application of Tantalum Silicide TaSi2 Powder:

1. Tantalum silicide TaSi2 powder is used to make silicon nitride-tantalum silicide composite ceramic materials,
2. Tantalum silicide TaSi2 powder is used for the preparation of tantalum silicide coating
3. Tantalum silicide TaSi2 powder is used to prepare tantalum silicide/silicon carbide coating based on carbon/carbon composite materials
4. Tantalum silicide TaSi2 powder is used for ceramic materials, electrode materials, thin-film materials and refractory materials.
5. Tantalum silicide TaSi2 powder is used as fine ceramic raw material powder.
 

Packing & Shipping of Tantalum Silicide TaSi2 Powder:
We have many different kinds of packing which depends on the tantalum silicide TaSi2 powder quantity.
Tantalum silicide TaSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Tantalum silicide TaSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.

2022-12-13

Silicide Powder

Hollow Glass Sphere Hollow Glass Beads

About Hollow Glass Sphere Hollow Glass Beads:
What is hollow glass microsphere? Hollow glass microspheres, sometimes termed microballoons or glass bubbles, have diameters ranging from 10 to 300 micrometers. Hollow spheres are used as lightweight fillers in composite materials such as syntactic foam and lightweight concrete. The hollow glass bead is a kind of specially processed glass bead, which is mainly characterized by smaller density and poorer thermal conductivity than glass bead. It is a new kind of micron-grade light material developed in the 1950s and 1960s. Its main component is borosilicate, with a general particle size of 10~250μm and a wall thickness of 1~2μm. Hollow glass beads are characterized by high compressive strength, high melting point, high resistivity, small thermal conductivity and thermal shrinkage coefficient, etc., and they are known as the "space-age material" in the 21st century.
Hollow glass microspheres, also known as bubbles, microbubbles, or micro balloons, are usually formulated from borosilicate - sodium salt glass mixtures and offer the advantages of low density, high heat and chemical resistance. The walls of glass microspheres are rigid and are usually about 10% thick of the diameter of the spheres. At present, spherical particles have a wide range of densities, from as low as 0.06g/ C3 to as high as 0.80g/ C3, with particle sizes ranging from 5um to 180um. The compressive strength of the hollow sphere is determined by the wall thickness of the hollow sphere and, as expected, the greater the density of the sphere, the higher the compressive strength.The lightweight hollow glass sphere is chemically stable, non-flammable, non-porous, excellent water resistance. Biomedicalmaterialsprogram is a trusted global Hollow Glass Sphere Hollow Glass Beads supplier. Feel free to send an inquiry about the latest price of Hollow Glass Sphere Hollow Glass Beads at any time.

Product Performance of Hollow Glass Sphere Hollow Glass Beads:
Hollow glass microspheres are micron-level hollow glass microspheres with a smooth surface. The main chemical component is borosilicate glass, and it is a hollow transparent sphere under the electron microscope. Hollow glass beads have low density, high strength, high temperature resistance, acid and alkali resistance, low thermal conductivity, electrical insulation and other properties. They have good fluidity and chemical stability, and they are multi-functional frontier new materials across fields.

Technical Parameter of Hollow Glass Sphere Hollow Glass Beads:

How are Hollow Glass Sphere Hollow Glass Beads Produced? 
How do you make glass microspheres?
1. Glass powder method
The glass powder method uses pre-prepared glass powder containing gases such as SO3 to pass through the flame at the temperature of 1100-1500℃. At this time, SO3 and other gases dissolved in the glass powder overflow from the inside of the glass due to the decrease in solubility and the change in the atmosphere of the kiln. At the same time, the glass powder becomes spherical under high temperature due to the surface tension. The spillage gas is sealed in the spherical particles to form hollow glass beads.
2. Spray granulation method
Spray granulation method is made in advance with special auxiliary reagent (boric acid, urea, ammonium pentaborate) aqueous solution of sodium silicate, and then through the nozzle to the solution injection into the spray dryer, is expected to drop after drying to get a certain particle size of powder particles, the final will be powder particle heating foam-forming hollow glass beads.
3. The droplet method
The liquid drop method adopts the same raw materials as the spray granulation method. The raw materials are 500 copies of sodium silicate (M (SiO2): M (Na2O) =2), and the same amount of 10% ammonium perborate aqueous solution is added. After mixing evenly, the hollow glass beads are sprayed into the spray drying tower.
4. Dry gel method
The alkyl salt was added to dilute hydrochloric acid and decompose with water. After gelation, the gel was dried in two stages at 60℃ and 150℃ and then crushed by a ball mill. After grading, the dried gel powder was obtained, which was foamed in a vertical electric furnace at 1280℃ to prepare hollow glass microspheres.
 
Applications of Hollow Glass Sphere Hollow Glass Beads:
Hollow glass microspheres are widely used in glass fiber reinforced plastic products, composite foam plastic, artificial marble, compound wood, sound insulation heat preservation material, atomic ash, deep-sea buoyancy, bowling, low-density cement, sealing material, lightweight, resin handicraft, the mural wall hanging frame, wall plate sandwich layer structure of lightweight packaging materials, electronic industry, absorbing material, lightweight concrete, such as emulsion explosive.
Hollow glass microspheres also provide a conductive coating. Conductive coatings of optimized thickness provide spherical particles with excellent conductivity and shielding properties while maintaining the weight savings associated with hollow, low-density materials. These conductive microbubbles are suitable for military applications, biotechnology, medical devices, electronics and other special industries.
Hollow glass beads have obvious weight reduction and sound insulation and heat preservation effect so that the products have good cracking resistance and reprocessing performance, is widely used in engineering plastics, insulation materials, rubber, buoyancy material, FRP, artificial marble, man-made agate, generation of composite materials such as wood, and the oil industry, aerospace, communications, 5 g new high-speed trains, cars, ships, in areas such as thermal insulation coatings, adhesives, vigorously promote the development of science and technology.

Packing & Shipping of Hollow Glass Sphere Hollow Glass Beads:
We have many different kinds of packing which depend on hollow glass spheres quantity.
Hollow glass spheres packing: 1kg/bag, 25kg/barrel, or 200kg/ barrel.
Hollow glass spheres shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-12-09

Silicide Powder

Tungsten Silicide WSi2 Powder CAS 12039-88-2

About Tungsten Silicide WSi2 Powder :
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is a conductive ceramic material. Tungsten silicide reacts violently with substances between strong acids, fluorine, oxidants and halogens. WSi2 as an anti-oxidation coating performs well in applications. In particular, similar to molybdenum disilicide MoSi2, the high emissivity of tungsten disilicide makes this material attractive for high-temperature radiant cooling and has the meaning of a heat shield.
 
Silicide is used in microelectronics as contact material, with a resistivity of 60-80μΩcm; it forms 1000°C. It is usually used as a shunt for polysilicon wires to increase their conductivity and increase signal speed. The silicide layer can be prepared by chemical vapor deposition, for example, using monosilane or dichlorosilane and tungsten hexafluoride as the source gas. The deposited film is non-stoichiometric and requires annealing to convert to a more resulting stoichiometric form. Tungsten silicide is a substitute for the early tungsten film. Tungsten silicide can also be used in microelectromechanical systems and oxidation-resistant coatings. Feel free to send an inquiry to get the latest price if you would like to buy Tungsten Silicide WSi2 Powder in bulk.

Characteristics of Tungsten Silicide WSi2 Powder:
Tungsten silicide WSi2 powder (CAS 12039-88-2) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical
conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Tungsten Silicide WSi2 Powder:

Chemical Composition of Tungsten Silicide WSi2 Powder:

How is Tungsten Silicide WSi2 Powder produced?
Tungsten powder and silicon powder are used as raw materials for synthetic silicide tungsten powder. They have an average of 24 hours in acetone. The starting powder is used in the measurement of thermal measurements, while the powder is 5: 1. Dry substances and dried, acetone evaporation. The preparative mixture was heat-treated at different temperatures at 50 ° C at different temperatures of 1250 to 1400 ° C. The heating rate is 10k · min -1. The mixture was placed in a tube furnace and heat treatment was carried out in an argon flow for 4 hours. After the heat treatment is over, the furnace is cooled to room temperature.
 
Application of Tungsten Silicide WSi2 Powder :
Tungsten silicide WSi2 powder is used in microelectronics as an electric shock material, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm; it is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase their conductivity and increase signal speed. The tungsten silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to transform into a more conductive stoichiometric form.
Tungsten silicide can replace the early tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. For this purpose, a film of tungsten silicide can be plasma-etched using, for example, silicide.

Packing & Shipping of Tungsten Silicide WSi2 Powder:
We have many different kinds of packing which depend on the tungsten silicide WSi2 powder quantity.
Tungsten silicide WSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Tungsten silicide WSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-12-08

Silicide Powder

Copper Silicide Cu5Si Powder CAS 12159-07-8

About Copper Silicide Cu5Si Powder:
Copper silicide (Cu5Si), also known as Penta-copper silicide, is a binary compound of silicon and copper. It is an intermetallic compound, which means that its properties lie between those of an ionic compound and an alloy. This solid crystalline material is a silvery solid insoluble in water. Biomedicalmaterialsprogram is a trusted global Copper Silicide Cu5Si Powder supplier. Feel free to send an inquiry about the latest price of Cu5Si at any time.

Product Performance of Copper Silicide Cu5Si Powder:
Copper silicide (Cu5Si) is a binary silicon compound of copper and an intermetallic compound, which means that its properties are between ionic compounds and alloys.

Technical Parameter of Copper Silicide Cu5Si Powder:

Chemical Composition of Copper Silicide Cu5Si Powder:

How is Copper Silicide Cu5Si PowderProduced? 
Copper silicide is formed by heating a mixture of copper and silicon.
 
Applications of Copper Silicide Cu5Si Powder:
Copper Silicide films are used for passivation of copper interconnectors, for diffusion suppression and electromigration suppression, and as diffusion barriers
Copper silicides are invoked in the direct process of organosilicon compounds in the industrial route. In this process, the copper catalyzes the addition of methyl chloride to the silicon in the form of its silicide.
An illustrative reaction provides the industrially useful dimethyldichlorosilane
2 CH3Cl + Si → sicl2 (CH3) 2

Packing & Shipping of Copper Silicide Cu5Si Powder:
We have many different kinds of packing which depend on the copper silicide Cu5Si powder quantity.
Copper Silicide Cu5Si powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Copper Silicide Cu5Si powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-12-01

Silicide Powder

Magnesium Silicide Mg2Si Powder CAS 22831-39-6

About Magnesium Silicide Mg2Si Powder:
Magnesium silicide is an inorganic compound composed of magnesium and silicon, and the chemical formula is Mg2Si, and the molecular weight is 76.71. Cyan or light purple powder, cubic crystal. The melting point is 1102 ° C, the relative density 1.94.
Magnesium silicide is insoluble in cold water and decomposes in hot water. It can be completely decomposed in vacuum or heating to 1200 ° C under hydrogen flow. Stable for the alkali solution. Decompose and produce silane and hydrogen. Mg2Si is the only stable compound of the MG-Si binary system, which has a high melting point, high hardness, high-elastic modulus characteristics, is a narrow bandgap n-type semiconductor material, manufactured in optoelectronic devices, energy devices, lasers, semiconductors, Heavy temperature control communication and other fields have important application prospects.  The Mg2Si crystal has an entire structure, which belongs to the facial cubic lattice, the space group is FM3M, the group number is 225, the lattice constant a = 0.6391 nm. In the crystal structure, each Si atom is located in the (0, 0, 0) position, forming a facial cubic structure having a side length A. The MG atom is located at a position (0.25, 0.25, 0.25) position, each MG atom located at the center of the tetrahedron composed of Si atoms, forming an unfilial structure of the edge length A / 2. Magnesium silicide is a narrow gap semiconductor. The growth of the crystals exhibits n-type conductivity, but it can be doped by doping with Ag, Ga, Sn, and possible Li (in high doped level). Feel free to send an inquiry to get the latest price if you would like to buy Magnesium Silicide Mg2Si Powder in bulk.

Characteristics of Magnesium Silicide Mg2Si Powder:
Magnesium silicide Mg2Si powder (CAS 22831-39-6) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Magnesium Silicide Mg2Si Powder:

Chemical Composition of Magnesium Silicide Mg2Si Powder:

How is Magnesium Silicide Mg2Si Powder produced?
The silica powder having a particle diameter of 180, magnesium powder is 100 g in a certain molar ratio, mix well into the iron, put the tubular reactor, vacuum and use a hydrogen gas reactive reaction system 3 times, vacuum to 133 Pa, A closed reactor, slowly warming up to a certain temperature, and after a while, the reaction product is lowered to room temperature at a certain rate to obtain the reaction product. Through the research of the silicide magnesium, the optimized process conditions are reaction temperature 600 ° C, the reaction time 4 h, mg: Si molar ratio 2.02: 1, cooling rate 10 ° C / min, product quality, magnesium silicide content of More than 98%.

Application of Magnesium Silicide Mg2Si Powder:
Magnesium silicide is often used to produce aluminum alloys, which contains about 1.5% magnesium silicide, with aging hardening features, can form G.P area and very uniform precipitation phase, which can improve the strength of the alloy.
Magnesium silicide is used to generate a 6000 series of aluminum alloys containing up to about 1.5% Mg2Si. The alloy of the group can be hardened to form the Guinier-PRESTON zone and a very fine precipitate, both result in an increase in the strength of the alloy.
The main potential electronic application of MG2Si is a thermoelectric generator.
Magnesium silicide is primarily used to synthesize other silicides.
Magnesium silicide is used to synthesize MgSin2 powder. It belongs to the preparation of non-oxide ceramic powder.
A by-product use of silicide of magnesium silicide.

Packing & Shipping of Magnesium Silicide Mg2Si Powder:
We have many different kinds of packing which depend on the magnesium silicide Mg2Si powder quantity.
Magnesium silicide Mg2Si powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Magnesium silicide Mg2Si powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-11-29

Silicide Powder

Cobalt Silicide CoSi2 Powder CAS 12017-12-8

About Cobalt Silicide CoSi2 Powder:
Cobalt Silicide is an intermetallic compound, a silicate of cobalt. It is a superconductor with a Ca transition temperature. Cobalt disilicide, chemical formula CoSi2.Molecular weight 115.11.Dark brown rhombic crystal.Melting point 1277℃, relative density 5.3. It can be oxidized at 1200℃ to erode its surface; Reacts with fluorine at low temperatures, and with chlorine at 300 ° C. Attack by hydrogen fluoride, dilute, concentrated nitric acid and sulfuric acid, also can be violently attacked by molten strong alkali. It acts slowly with boiling concentrated hydrochloric acid.
CoSi2 has low resistivity, good thermal stability, and is widely used as a contact in large-scale integrated circuits. And CoSi2 has a similar crystal structure to Si, so it can form an epitaxial CoSi2/Si structure on Si substrate, which is used to study the interface characteristics of epitaxial silicon metal. Feel free to send an inquiry to get the latest price if you would like to buy Cobalt Silicide CoSi2 Powder in bulk.

Characteristics of Cobalt Silicide CoSi2 Powder:
Cobalt silicide CoSi2 powder (CAS 12017-12-8) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy systemthe intermediate phase.

Technical Parameter of Cobalt Silicide CoSi2 Powder:

How is Cobalt Silicide CoSi2 Powder produced?
In general, the manufacturing method of cobalt disilicide is to first form metal cobalt (CO) layer on a silicon substrate and then after two annealing treatments to convert cobalt to Cobalt disilicide. The first annealing process involves the diffusion of shillings of cobalt into a siliceous substrate to form a layer of cobalt silicate (COSi). The second annealing process is to convert the cobalt silicate layer into Cobalt disilicide with a low resistance to reduce the resistance of the component.
 
Application of Cobalt Silicide CoSi2 Powder:
Cobalt Silicide CoSi2 Powder is used in optoelectronic devices, electronic devices, energy devices, lasers, semiconductors, etc.
Silicide nanostructures have potential important applications in a series of fields of nanoelectronics: semiconductor silicide nanostructures (FeSi2) can be used to prepare nano-electronic active devices, which may have very important applications in silicon-based nano-luminescent devices; Metallic silicides (CoSi2, NiSi2) can be used as nanowires in future quantum computers and fault-tolerant terahertz nanocircuit computers. Since epitaxial silicide conductors can be prepared on silicon substrates, their performance will be greatly improved compared with ordinary metal nanowires because of the absence of grain boundaries.Au nanostructures can also be used in molecular electronics as a single molecule or nanoelectrode of several molecules. In the process of semiconductor components, low resistance Cobalt disilicide (CoSi2) layers are formed at internal electrical connection points such as gate, source, or drain.

Packing & Shipping of Cobalt Silicide CoSi2 Powder:
We have many different kinds of packing which depend on the cobalt silicide CoSi2 powder quantity.
Cobalt silicide CoSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Cobalt silicide CoSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

2022-11-28

Silicide Powder

Chromium Silicide CrSi2 Powder CAS 12018-09-6

About Chromium Silicide CrSi2 Powder:
Silicide chromium is an inorganic compound that is chemically formula CrSi2. Silicide is a gray cubic crystal, six-square crystal system. The melting point is close to 1550 ° C, and the bond form in the crystal is similar to CR3Si, with metal gloss.
 
CrSi2 is dissolved in hydrochloric acid and royal water. The radiation of silicide is high and the resistance temperature coefficient is small. The radiation of silicide is high and the resistance temperature coefficient is small. Chromium Silicide CrSi2 IS A Narrow Gap Semiconductor, Potential P-Type Thermoelectric Material, Up to 973 K, with a bandgap of 0.30 EV. Feel free to send an inquiry to get the latest price if you would like to buy Chromium Silicide CrSi2 Powder in bulk.

Characteristics of Chromium Silicide CrSi2 Powder:
Chromium silicide CrSi2 powder (CAS 12018-09-6) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical
conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Chromium Silicide CrSi2 Powder:

Chemical Composition of Chromium Silicide CrSi2 Powder:

How is Chromium Silicide CrSi2 Powder produced?
Chromium Silicide can be prepared from anhydrous chloride as a precursor, reacts with silicon at high temperatures. CrSi2 is also obtained by reducing chloride and sodium fluorosilicate at high temperatures.
 
Applications of Chromium Silicide CrSi2 Powder:
Chromium Silicide CrSi2 powder is used in a silicide chromium film, a glass coating, a silicide target, a silicide sputtering target, an N-type semiconductor.
Application of Chromium Silicide in the preparation of ceramic materials in the preparation of polycarbonate
Chromium Silicide CrSi2 promotes the cleavage reaction of PCS, increase the ceramic yield of the primary drive body,
Chromium Silicide CrSi2 can reduce the linear shrinkage of the initial target in the cracking process, improve the performance of ceramic material.

Packing & Shipping of Chromium Silicide CrSi2 Powder:
We have many different kinds of packing which depend on the chromium silicide CrSi2 powder quantity.
Chromium silicide CrSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Chromium silicide CrSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

 

2022-11-27