What is Hafnium Disilicide

What is Hafnium Disilicide HfSi2?

The molecular formula of HfSi2 is hafnium disilicide. It is a gray powder.

Hafnium silicide is a refractory intermetallic compound and an intermediate metal silicide. A unique combination of chemical and physical characteristics makes hafnium silicide an highly effective choice for fields like semiconductors and bulk structural components that are made of oxides of complementary metals.

Hafnium disilicide nanomaterials exhibit unique electrical, optical, magnetic and thermoelectric properties, and even have potential applications in the field of catalysis.

What are the uses of Hafnium Disilicide and HfSi2?

1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating

Carbon fiber reinforced carbon (Chand C), composite is a novel kind of high-temperature composite that uses carbon fiber reinforcement as well as pyrolytic carbon as a matrix. Its strength at high temperatures as well as wear resistance and friction and wear resistance led to the United States developing Cmax C composites. These composites were developed from thermal structure materials and cauterized heatproof materials. C/C can be used as a thermal structure material in components for gas turbine engines, spacecraft nose cone cap and wing lead edge and many more. The majority of these components operate in a high temperature and oxidation environment.

CPAC composites However, they are easy to oxidize. They will usually not function normally in an oxygen environment higher than 400. Chammer C composites need to be adequately protected from oxidation. The creation of an anti-oxidation coating is among the most important protective measures. The results show that when refractory metals such as Zr, Hf, Ta TiB2 and various other metals that are refractory are incorporated to the carbon matrix the resistance to ablation of C and C composites is enhanced. To understand the effect of metal Hf,Ta on the ablation efficiency of Chand-C composites SiC-HfSi2-TaSi2 anti-ablation layer was using an embedding technique and the ablation efficiency of the anti-ablation coating was measured using an oxyacetylene ablation instrument. Knot.

2. To develop organic light-emitting devices

The covers of the package contain cathode and light emitting layers that are on the anode. Additionally, the package cover includes a silicon carbitride coating as well as a barrier layer on top of the silicon carbonitride. The material for the barrier layer is silicide or oxides. They are selected from a minimum of tantalum, chromium, hafnium, titanium and molybdenum, tungsten, and chromium-silicide. Metal dioxide is selected from magnesium oxide and aluminum trioxide, as along with zirconium oxide and hafnium dioxide. The lifespan of these organic light-emitting devices is likely to be extended.

3. To prepare silicon-germanium alloy-based thermoelectric elements

The alloy of silicon and germanium that forms the silicon thermoelectric element consists of an electrode layer and a silicon–germanium alloy-based thermoelectric layer. A barrier layer is placed between the electrode layers as well as the base thermoelectric layer made of silicon and germanium. The barrier layer is a mix of silicide & silicon nitride. The silicide should contain at minimum one of these: molybdenum, tungsten and nickel, cobalt silicides, cobalt cobalt, nickel, silicides, zirconium, tantalum, hafnium silicide, and tungsten silicide. The interface of silicon-germanium alloy based thermoelectric element has an excellently bonded structure. It is resistant to diffusion and cracks, can withstand high temperature acceleration for a prolonged duration, and is also thermally stable.

4. To make the cermet coating with high temperature resistance, resistance to oxidation and other properties

The composite film is characterized by the fact that it is composed of refractory material, carbide, and intermetallic compound and the thickness of the film is 10mm x 50mm. The refractory element is one, more, of molybdenum. tantalum. zirconium. and hafnium. The crystal structure of the coating is composed of amorphous and / or polycrystalline nanoparticles.

Hafnium Silicide HFSi2 Powder

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Hafnium silicicide HfSi2 Pearl Supplier

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